“Optimization of Long-Range Order in Solvent Vapor Annealed Poly(styrene)-block-poly(lactide) Thin Films for Nanolithography” by A. Baruth, Myungeun Seo, Chun Hao Lin, Kern Walster, Arjun Shankar, Marc A. Hillmyer, and C. Leighton just appeared in ACS Applied Materials and Interfaces as an ASAP Article.

Link: http://pubs.acs.org/doi/pdf/10.1021/am503199d

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